Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering

Zeitschrift fur Kristallographie, Supplement

Volumn 2, Issue 26, 2007, Pages 241-246

  Kuzel R ^a   Nichtova L ^a   Herman D ^b   Sicha J ^b   Musil, J ^b  

^a CHARLES UNIVERSITY   (Czech Republic)

^b UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Thin film growth; Thin films; Titanium oxide; X ray diffraction

Indexed keywords

EID: 54849432292     PISSN: 0930486X     EISSN: None     Source Type: Journal    
DOI: 10.1524/zksu.2007.2007.suppl_26.241     Document Type: Conference Paper

References (6)

1. Sopyan, N., Watanabe, M., Murasawa, S., Hashimoto, K & Fujishima, A., 1996, J. Photochem. Photobiol., A98, 79.
2. Byun, I., Jin, Y., Kim, B., Lee, J.K. & Park, D., 2000, J. Haz. Mat., B73, 199.
3. Negishi, J., Takeuchi, M. & Ibusuki, T.,1998, J. Mater. Sci., 33, 5789.
4. Kužel, R., Nichtová, L., Matěj, Z., Heřman, D., Šicha, J. & Musil, J., 2007, Zeitschrift für Kristallographie (Supplement), this issue.
5. Musil, J., Heřman, D. & Šicha, J., 2006, J. Vac. Sci. Technol., A24 (3), 521-528.
6. Baroch, P., Musil, J., Vlcek, J., Nam, K.H. & Han, J.G., 2005, Surf. Coat. Technol., 193, 107.