Assessment of as-deposited microcrystalline silicon films on polymer substrates using electron cyclotron resonance-plasma enhanced chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1987-1990

  Bae, Sanghoon ^a   Fonash, Stephen J ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON (A-SI); DEGREE OF CRYSTALLINITY; ELECTRON-CYCLOTRON-RESONANCE PLASMA DEPOSITIONS; MICROCRYSTALLINE SILICON FILMS; PL BANDS; PL INTENSITY; POLYETHERSULFONES; POLYMER SUBSTRATE; RADIO FREQUENCIES; SI FILMS; SUBSTRATE BIAS;

ACTIVATION ENERGY; AMORPHOUS FILMS; ASTATINE; CYCLOTRONS; ELECTRON CYCLOTRON RESONANCE; METALLIC FILMS; MICROCRYSTALLINE SILICON; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYETHYLENE TEREPHTHALATES; POLYMER FILMS; RESONANCE; SUBSTRATES; THERMOPLASTICS;

AMORPHOUS SILICON;

EID: 78649789534     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581715     Document Type: Conference Paper

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