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ChemPhysChem

Volumn 11, Issue 17, 2010, Pages 3609-3616

High-Resolution Surface Chemical Analysis of a Trifunctional Pattern Made by Sequential Colloidal Shadowing

(3) Ogaki, Ryosuke a Lyckegaard, Folmer a Kingshott, Peter a

a AARHUS UNIVERSITY (Denmark)

Author keywords

Colloidal assembly; Mass spectrometry; Self assembly; Surface analysis; X ray photoelectron spectroscopy (xps)

Indexed keywords

CHEMICAL ANALYSIS; CHEMICAL MODIFICATION; COLLOIDS; GOLD COATINGS; GOLD DEPOSITS; IONS; LUNAR SURFACE ANALYSIS; MASS SPECTROMETRY; ORGANIC POLYMERS; PARTICLE SIZE ANALYSIS; PHOTOELECTRONS; PHOTONS; PHYSICAL VAPOR DEPOSITION; PLASMA ETCHING; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SELF ASSEMBLY; SILICA; SURFACE ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

COLLOIDAL ASSEMBLY; COLLOIDAL SELF-ASSEMBLY; HIGH-RESOLUTION IMAGING; PATTERNING METHODS; PHYSICAL VAPOUR DEPOSITION; SURFACE CHEMICAL ANALYSIS; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TOP DOWN APPROACHES;

SELF ASSEMBLED MONOLAYERS;

EID: 78649754956 PISSN: 14394235 EISSN: 14397641 Source Type: Journal
DOI: 10.1002/cphc.201000737 Document Type: Article

Times cited : (12)

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