Bilayer systems of tantalum or zirconium nitrides and molybdenum for optimized diamond deposition

Thin Solid Films

Volumn 519, Issue 5, 2010, Pages 1600-1605

  Poulon Quintin, Angéline ^a   Faure, Cyril ^a   Teulé Gay, Lionel ^a   Manaud, Jean Pierre ^a  

^a UNIVERSITÉ DE BORDEAUX   (France)

Author keywords

Diamond; Diffusion barrier; Molybdenum; Nucleation; Refractory metal nitride

Indexed keywords

CHEMICAL STABILITY; DIAMOND DEPOSITS; DIAMONDS; DIFFUSION BARRIERS; DIFFUSION COATINGS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLYBDENUM; MOLYBDENUM COMPOUNDS; NITRIDES; NUCLEATION; REACTIVE SPUTTERING; REFRACTORY METALS; ZIRCONIUM COMPOUNDS;

BI-LAYER COATINGS; DIAMOND DEPOSITION; NANO-CRYSTALLINE DIAMONDS; SPUTTERING CONDITIONS; STATIC CONDITIONS; TANTALUM NITRIDES; WC-CO SUBSTRATES; ZIRCONIUM NITRIDE;

TANTALUM COMPOUNDS;

EID: 78649738756     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.011     Document Type: Conference Paper

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