WC-Co substrate surface pretreatments with aluminum compounds prior to polycrystalline CVD diamond deposition

International Journal of Refractory Metals and Hard Materials

Volumn 17, Issue 6, 1999, Pages 445-452

  Kolber, T ^a   Koepf, Arno ^a   Haubner, R ^a   Hutter, H ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ALUMINA; CHEMICAL VAPOR DEPOSITION; COBALT; DIAMOND FILMS; POLYCRYSTALLINE MATERIALS; SECONDARY ION MASS SPECTROMETRY; SOLUTIONS; SUBSTRATES; SURFACE TREATMENT; SUSPENSIONS (FLUIDS);

ALUMINUM NITRATE;

TUNGSTEN CARBIDE;

EID: 0033325042     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0263-4368(00)00003-2     Document Type: Article

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