Water-in-oil dispersion for KH2PO4 (KDP) crystal CMP

Journal of Dispersion Science and Technology

Volumn 31, Issue 12, 2010, Pages 1611-1617

  Wang, Biling ^a   Li, Yuzhuo ^b   Gao, Hang ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b CLARKSON UNIVERSITY   (United States)

Author keywords

Abrasive free; CMP; KDP crystal; Water in oil dispersion

Indexed keywords

ABRASIVE PARTICLES; ACTIVATING AGENTS; ADVANCED MATERIALS; AQUEOUS DISPERSIONS; CMP; CMP SLURRY; CRYSTAL SURFACES; DODECANOL; DYNAMIC LIGHTING; ETCH RATES; KDP CRYSTALS; MATERIAL REMOVAL; MATERIAL REMOVAL RATE; MICRO-ELECTRONIC DEVICES; NON-AQUEOUS; OPTICAL CRYSTALS; POLISHING MECHANISM; POLISHING PROCESSS; POTENTIAL APPLICATIONS; SUBSTRATE SURFACE; SYSTEM-BASED; TECHNIQUES USED; TRITON X-100; WATER MOLECULE; WATER-IN-OIL; WATER-IN-OIL DISPERSION;

ABRASIVES; CHEMICAL MECHANICAL POLISHING; CRYSTALS; DISPERSIONS; DYNAMICS; FILMS; MICROELECTRONICS; MICROEMULSIONS; MOLECULES; NUCLEAR MAGNETIC RESONANCE; POLISHING; RESONANCE; SURFACE ACTIVE AGENTS;

CHEMICAL POLISHING;

EID: 78649388728     PISSN: 01932691     EISSN: 15322351     Source Type: Journal    
DOI: 10.1080/01932690903297330     Document Type: Article

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