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Volumn 16, Issue 3, 2010, Pages 202-204

Simulation of reactive sputter deposition of TiO2 films

Author keywords

Hysteresis; Reactive sputter deposition; TiO2

Indexed keywords


EID: 78649355549     PISSN: 13921320     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (7)

References (14)
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  • 2
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    • Vancoppenolle, V., Jouan, P. Y., Wautelet, M., Dauchot, J. P., Hecq, M. D. C. Magnetron Sputtering Deposition of TiO2 Films in Argon-Oxygen Gas Mixtures: Theory and Experiments Surface and Coatings Technology 116-119 1999: pp. 933-937.
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  • 3
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    • Low Temperature Growth of Rutile TiO2 Films in Modified RF Magnetron Sputtering
    • Okimura, K. Low Temperature Growth of Rutile TiO2 Films in Modified RF Magnetron Sputtering Surface and Coatings Technology 135 2001: pp. 286-290.
    • (2001) Surface and Coatings Technology , vol.135 , pp. 286-290
    • Okimura, K.1
  • 4
    • 0036535467 scopus 로고    scopus 로고
    • Effect of Total and Oxygen Partial Pressures on Structure of Photocatalytic TiO2 Films Sputtered on Unheated Substrate
    • Zeman, P., Takabayashi, S. Effect of Total and Oxygen Partial Pressures on Structure of Photocatalytic TiO2 Films Sputtered on Unheated Substrate Surface and Coatings Technology 153 2002: pp. 93-99.
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    • Zeman, P.1    Takabayashi, S.2
  • 5
    • 0141427833 scopus 로고    scopus 로고
    • Pulse Mode Effects on Crystallization Temperature of Titanium Dioxide Films in Pulse Magnetron Sputtering
    • Miyagi, T., Kamei, M., Ogawa, T., Mitsuhashi, T., Yamazaki, A., Sato, T. Pulse Mode Effects on Crystallization Temperature of Titanium Dioxide Films in Pulse Magnetron Sputtering Thin Solid Films 442 2003: pp. 32-35.
    • (2003) Thin Solid Films , vol.442 , pp. 32-35
    • Miyagi, T.1    Kamei, M.2    Ogawa, T.3    Mitsuhashi, T.4    Yamazaki, A.5    Sato, T.6
  • 6
    • 0042328065 scopus 로고    scopus 로고
    • Time-Resolved Investigation of Plasma Parameters During Deposition of Ti and TiO2 Thin Films
    • Bäcker, H., Henderson, P. S., Bradley, J. W., Kelly, P. J. Time-Resolved Investigation of Plasma Parameters During Deposition of Ti and TiO2 Thin Films Surface and Coatings Technology 174-175 2003: pp. 909-913.
    • (2003) Surface and Coatings Technology , vol.174-175 , pp. 909-913
    • Bäcker, H.1    Henderson, P.S.2    Bradley, J.W.3    Kelly, P.J.4
  • 8
    • 33646425584 scopus 로고    scopus 로고
    • Time-Resolved Optical Emission Spectroscopy During Pulsed DC Magnetron Sputter Deposition of Ti and TiO2 Thin Films
    • Belkind, A., Zhu, W., Lopez, J., Becker, K. Time-Resolved Optical Emission Spectroscopy During Pulsed DC Magnetron Sputter Deposition of Ti and TiO2 Thin Films Plasma Sources Science and Technology 15 2006: pp. S17-S25.
    • (2006) Plasma Sources Science and Technology , vol.15
    • Belkind, A.1    Zhu, W.2    Lopez, J.3    Becker, K.4
  • 9
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    • Reactive Sputter Deposition of Titanium Dioxide
    • Dannenberg, R., Greene, P. Reactive Sputter Deposition of Titanium Dioxide Thin Solid Films 360 2000: pp. 122-127.
    • (2000) Thin Solid Films , vol.360 , pp. 122-127
    • Dannenberg, R.1    Greene, P.2
  • 10
    • 85054686006 scopus 로고    scopus 로고
    • Optical Plasma Diagnostics During Reactive Magnetron Sputtering
    • In: Depla, D., Mahieu, S., Editors, Berlin: Springer
    • Konstantinidis, S., Gaboriau, F., Gaillard, M., Hecq, M., Ricard, A. Optical Plasma Diagnostics During Reactive Magnetron Sputtering. In: Depla, D., Mahieu, S., Editors. Reactive Sputter Deposition, Berlin: Springer; 2008: pp. 301-335.
    • (2008) Reactive Sputter Deposition , pp. 301-335
    • Konstantinidis, S.1    Gaboriau, F.2    Gaillard, M.3    Hecq, M.4    Ricard, A.5
  • 11
    • 0032300161 scopus 로고    scopus 로고
    • Use of a Theoretical Model to Investigate RF and DC Reactive Sputtering of Titanium and Chromium Oxide Coatings
    • Martin, N., Rousselot, C. Use of a Theoretical Model to Investigate RF and DC Reactive Sputtering of Titanium and Chromium Oxide Coatings Surface and Coatings Technology 110 1998: pp. 158-167.
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    • Martin, N.1    Rousselot, C.2
  • 12
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    • Influence of the Pumping Speed on the Hysteresis Effect in the Reactive Sputtering of Thin Films
    • Kadlec, S., Musil, J., Vyskočil, J. Influence of the Pumping Speed on the Hysteresis Effect in the Reactive Sputtering of Thin Films Vacuum 37 1987: pp. 729-738.
    • (1987) Vacuum , vol.37 , pp. 729-738
    • Kadlec, S.1    Musil, J.2    Vyskočil, J.3
  • 13
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  • 14
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.