Near-infrared femtosecond laser for studying the strain in Si 1-xGex alloy films via second-harmonic generation

IEEE Photonics Journal

Volumn 2, Issue 6, 2010, Pages 974-980

  Zhao, Ji Hong ^a   Cheng, Bu Wen ^b   Chen, Qi Dai ^a   Su, Wen ^a   Jiang, Ying ^a   Chen, Zhan Guo ^a   Jia, Gang ^a   Sun, Hong Bo ^a  

^a JILIN UNIVERSITY   (China)

^b INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

crystal symmetry; Femtosecond laser; second harmonic generation; Si1 xGex alloy; strain

Indexed keywords

ALLOY FILM; DOUBLE CRYSTAL X-RAY DIFFRACTION; FEMTO-SECOND LASER; INHOMOGENEITIES; NEAR INFRARED; ROTATIONAL ANGLE; SECOND HARMONIC GENERATION; SHG INTENSITY; SI1-XGEX ALLOY; STRAIN-RELAXED; STRAINED-SI;

GERMANIUM; HARMONIC ANALYSIS; HARMONIC GENERATION; INFRARED DEVICES; INFRARED LASERS; METALLIC FILMS; PULSED LASER APPLICATIONS; SILICON; SILICON ALLOYS; ULTRASHORT PULSES; X RAY DIFFRACTION;

CRYSTAL SYMMETRY;

EID: 78649279327     PISSN: 19430655     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPHOT.2010.2089976     Document Type: Article

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