Application of dielectric barrier discharge for plasma polymerization processes

Journal of Optoelectronics and Advanced Materials

Volumn 10, Issue 8, 2008, Pages 2028-2032

  Topala, I ^a,b   Asandulesa, M ^a   Dumitrascu, N ^a   Popa, G ^a   Durand, J ^b  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

^b UNIVERSITÉ DE MONTPELLIER   (France)

Author keywords

Acrylic acid; Dielectric barrier discharge; N vinyl formamide; Polymerization

Indexed keywords

ACRYLIC MONOMERS; AMIDES; ATMOSPHERIC PRESSURE; CARBOXYLIC ACIDS; CONTACT ANGLE; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; FLOW CONTROL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR OXYGEN; OPTICAL EMISSION SPECTROSCOPY; PLASMA POLYMERIZATION; POLYMERIZATION; STRUCTURE (COMPOSITION); SUPERSATURATION;

ACRYLIC ACIDS; ATTENUATED TOTAL REFLECTANCE FOURIER TRANSFORM INFRARED; DIELECTRIC BARRIER DISCHARGES; N-VINYL FORMAMIDES; PLASMA POLYMERIZED FILM; POLYMERIZATION PROCESS; POLYMERIZATION REACTION; SPATIALLY RESOLVED OPTICAL EMISSION;

POLYMER FILMS;

EID: 49149121963     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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