Synthesis of polystyrene thin films by means of an atmospheric-pressure plasma torch and a dielectric barrier discharge

IEEE Transactions on Plasma Science

Volumn 37, Issue 6 PART 1, 2009, Pages 951-960

  Merche, Delphine ^a   Poleunis, Claude ^b   Bertrand, Patrick ^b   Sferrazza, Michele ^a   Reniers, François ^a  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^b UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

Plasma CVD; Plasma materials processing applications; Plasmas; Plastics

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; CARRIER GAS; CHEMICAL STRUCTURE; CONTROLLED ATMOSPHERE; DEPOSITED COATINGS; DIELECTRIC BARRIER DISCHARGES; FTIR; HIGHER-DEGREE; INFRARED REFLECTION ABSORPTION SPECTROSCOPY; PLASMA CVD; PLASMA GAS; PLASMA MATERIALS-PROCESSING APPLICATIONS; PLASMA PARAMETER; PLEXIGLASS CHAMBERS; POLYSTYRENE THIN FILMS; RF PLASMA TORCH; STATIC SECONDARY ION MASS SPECTROSCOPIES; WATER CONTACT ANGLE; XPS; XPS SPECTRA;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CONTACT ANGLE; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ELASTOMERS; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS ABSORPTION; GAS PERMEABLE MEMBRANES; HELIUM; OPTICAL DATA STORAGE; OPTICAL EMISSION SPECTROSCOPY; OPTICAL INSTRUMENTS; OPTICAL MICROSCOPY; OXYGENATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA JETS; PLASMA THEORY; PLASMA TORCHES; PLASTIC COATINGS; PLASTICITY; PLASTICS APPLICATIONS; POLYMER BLENDS; POLYSTYRENES; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPECTROSCOPIC ANALYSIS; STAINLESS STEEL; STYRENE; SUBSTRATES; SYNTHESIS (CHEMICAL); WATER ABSORPTION; WAVE PLASMA INTERACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSORPTION SPECTROSCOPY;

EID: 67650315712     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2009.2014165     Document Type: Article

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