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Volumn 313, Issue 1, 2010, Pages 16-19
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Rapid growth and characterization of InN nanocolumns on InGaN buffer layers at a low ratio of N/In
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Author keywords
A3. Molecular beam epitaxy; B1. InN; B1. Nanocolumns; B2. Semiconducting III V materials
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Indexed keywords
A3. MOLECULAR BEAM EPITAXY;
B1. INN;
FIELD EMISSION SCANNING ELECTRON MICROSCOPES;
GAN EPILAYERS;
GAS-SOLID;
GROWTH MECHANISMS;
HIGH QUALITY;
INGAN BUFFER LAYER;
INN FILMS;
JOINT ACTIONS;
NANO-COLUMNS;
NANOCOLUMN;
RADIO FREQUENCIES;
RAPID GROWTH;
SEMI CONDUCTING III-V MATERIALS;
VOLMER-WEBER MODES;
BUFFER LAYERS;
EPITAXIAL GROWTH;
GALLIUM NITRIDE;
MOLECULAR BEAM EPITAXY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR GROWTH;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION;
MOLECULAR BEAMS;
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EID: 78549234641
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2010.10.033 Document Type: Article |
Times cited : (9)
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References (19)
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