Effect of copper content and substrate bias on structure and mechanical properties of reactive sputtered CrCuN films

Journal of Alloys and Compounds

Volumn 509, Issue 3, 2011, Pages 789-793

  Tan, Shuyong ^a   Zhang, Xuhai ^a   Wu, Xiangjun ^a   Fang, Feng ^a   Jiang, Jianqing ^a  

^a SOUTHEAST UNIVERSITY   (China)

Author keywords

CrCuN film; Cu content; DC magnetron sputtering; Morphology; Preferred orientation; Substrate bias

Indexed keywords

CRCUN FILM; CU CONTENT; DC MAGNETRON SPUTTERING; PREFERRED ORIENTATIONS; SUBSTRATE BIAS;

FILM GROWTH; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MORPHOLOGY; SUBSTRATES; X RAY POWDER DIFFRACTION;

COPPER;

EID: 78449248546     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.09.090     Document Type: Article

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