-
1
-
-
0033335749
-
Evaluation of a dilute Nitrogen Trifluoride plasma clean in a dielectric PECVD reactor
-
Pruette, L.; Karecki, S.; Reif, R.; Entley, W.; Langan, J.; Hazari, V.; Hines, C. Evaluation of a dilute Nitrogen Trifluoride plasma clean in a dielectric PECVD reactor Electrochem. Solid-State Lett. 1999, 2, 592
-
(1999)
Electrochem. Solid-State Lett.
, vol.2
, pp. 592
-
-
Pruette, L.1
Karecki, S.2
Reif, R.3
Entley, W.4
Langan, J.5
Hazari, V.6
Hines, C.7
-
2
-
-
33947261064
-
Electrochemical synthesis and applications of NF3
-
Tasaka, A. Electrochemical synthesis and applications of NF3 J. Fluorine Chem. 2007, 128, 296
-
(2007)
J. Fluorine Chem.
, vol.128
, pp. 296
-
-
Tasaka, A.1
-
3
-
-
78449240984
-
PFC emissions reductions and process improvements with remote plasma CVD chamber cleans
-
Mendicino, L.; Brown, P. T.; Filipiak, S.; Nauert, C.; Estep, H.; Fletcher, M. PFC emissions reductions and process improvements with remote plasma CVD chamber cleans Proc. Electrochem. Soc. 2002, 15, 144
-
(2002)
Proc. Electrochem. Soc.
, vol.15
, pp. 144
-
-
Mendicino, L.1
Brown, P.T.2
Filipiak, S.3
Nauert, C.4
Estep, H.5
Fletcher, M.6
-
4
-
-
78449247551
-
Reduced clean time and PFC emissions reduction through remote plasma clean for lamp heated CVD chambers
-
Mendicino, L.; Nauert, C.; Brown, P. T.; Golovato, S.; Day, B.; Atherton, A.; Nowak, T.; Silvetti, D.; Hartz, C.; Johnson, A.; Maroulis, P. Reduced clean time and PFC emissions reduction through remote plasma clean for lamp heated CVD chambers Proc. Electrochem. Soc. 2001, 6, 15
-
(2001)
Proc. Electrochem. Soc.
, vol.6
, pp. 15
-
-
Mendicino, L.1
Nauert, C.2
Brown, P.T.3
Golovato, S.4
Day, B.5
Atherton, A.6
Nowak, T.7
Silvetti, D.8
Hartz, C.9
Johnson, A.10
Maroulis, P.11
-
6
-
-
0034275380
-
Gas utilization in remote plasma cleaning and stripping applications
-
Kastenmeier, B. E.; Oehrlein, G.; Langan, J.; Entley, W. Gas utilization in remote plasma cleaning and stripping applications J. Vac. Sci. Technol. 2000, A18, 2102
-
(2000)
J. Vac. Sci. Technol.
, vol.18
, pp. 2102
-
-
Kastenmeier, B.E.1
Oehrlein, G.2
Langan, J.3
Entley, W.4
-
7
-
-
78449245893
-
3 chamber cleans on multiple CVD platforms
-
3 chamber cleans on multiple CVD platforms Proc. Electrochem. Soc. 2002, 15, 127
-
(2002)
Proc. Electrochem. Soc.
, vol.15
, pp. 127
-
-
Goolsby, B.1
Vartanian, V.L.2
Mendicino, L.3
Rivers, J.4
Soyemi, A.5
Sun, S.6
Turner, M.7
Esber, C.8
-
8
-
-
3142594512
-
Managing fluorinated byproducts of CVD chamber cleans
-
Vartanian, V.; Goolsby, B.; Mendicino, L.; Brown, P. T.; Vires, J.; Rose, S.; Babbitt, D. Managing fluorinated byproducts of CVD chamber cleans Semicond. Int. 2003, 26, 77
-
(2003)
Semicond. Int.
, vol.26
, pp. 77
-
-
Vartanian, V.1
Goolsby, B.2
Mendicino, L.3
Brown, P.T.4
Vires, J.5
Rose, S.6
Babbitt, D.7
-
9
-
-
41849117252
-
Life-cycle emissions from photovoltaics
-
Fthenakis, V.; Kim, H. C.; Alsema, E. Life-cycle emissions from photovoltaics Environ. Sci. Technol. 2008, 42 (6) 2168-2174
-
(2008)
Environ. Sci. Technol.
, vol.42
, Issue.6
, pp. 2168-2174
-
-
Fthenakis, V.1
Kim, H.C.2
Alsema, E.3
-
10
-
-
58249093448
-
-
The missing greenhouse gas. News Feature
-
Hoag, H. The missing greenhouse gas. News Feature, Nature Reports Climate Change 2008, 2, 99; www.nature.com/reports/climatechange.
-
(2008)
Nature Reports Climate Change
, vol.2
, pp. 99
-
-
Hoag, H.1
-
11
-
-
78449232212
-
-
Proc. 22nd European Photovoltaic Solar Energy Conference, Milano, Italy, September
-
de Wild-Scholten, M.; Alsema, E.; Fthenakis, V.; Agostinelli, G.; Dekkers, H.; Roth, K.; Kinzig, V. Fluorinated greenhouse gases in photovoltaic module manufacturing: potential emissions and abatement strategies. Proc. 22nd European Photovoltaic Solar Energy Conference, Milano, Italy, September, 2007.
-
(2007)
Fluorinated Greenhouse Gases in Photovoltaic Module Manufacturing: Potential Emissions and Abatement Strategies.
-
-
De Wild-Scholten, M.1
Alsema, E.2
Fthenakis, V.3
Agostinelli, G.4
Dekkers, H.5
Roth, K.6
Kinzig, V.7
-
13
-
-
78449243519
-
-
Proc. 23rd European Photovoltaic Solar Energy Conference, Valencia, Spain, September
-
Schottler, M.; de Wild-Scholten, M. The carbon footprint of PECVD chamber cleaning using fluorinated gases. Proc. 23rd European Photovoltaic Solar Energy Conference, Valencia, Spain, September, 2008.
-
(2008)
The Carbon Footprint of PECVD Chamber Cleaning Using Fluorinated Gases.
-
-
Schottler, M.1
De Wild-Scholten, M.2
-
14
-
-
78449255317
-
-
Proc. Electronics Goes Green 2008+, Berlin, Germany, September
-
Schottler, M.; de Wild-Scholten, M. The life-cycle environmental impacts of etching silicon wafers and (PE)CVD chamber cleaning. Proc. Electronics Goes Green 2008+, Berlin, Germany, September, 2008.
-
(2008)
The Life-cycle Environmental Impacts of Etching Silicon Wafers and (PE)CVD Chamber Cleaning.
-
-
Schottler, M.1
De Wild-Scholten, M.2
-
15
-
-
50949090100
-
NF3, the greenhouse gas missing from Kyoto
-
Prather, M. J.; Hsu, J. NF3, the greenhouse gas missing from Kyoto Geophys. Res. Lett. 2008, 35, L12810
-
(2008)
Geophys. Res. Lett.
, vol.35
, pp. 12810
-
-
Prather, M.J.1
Hsu, J.2
-
16
-
-
58249086576
-
Nitrogen trifluoride in the global atmosphere
-
Weiss, R. F.; Mühle, J.; Salameh, P. K.; Harth, C. M. Nitrogen trifluoride in the global atmosphere Geophys. Res. Lett. 2008, 35, L20821
-
(2008)
Geophys. Res. Lett.
, vol.35
, pp. 20821
-
-
Weiss, R.F.1
Mühle, J.2
Salameh, P.K.3
Harth, C.M.4
-
17
-
-
0003550027
-
-
Intergovernmental Panel on Climate Change (IPCC)., IPCC: Potsdam, Germany
-
Intergovernmental Panel on Climate Change (IPCC). Third Assessment Report: Climate Change, 2001, IPCC: Potsdam, Germany, p 353.
-
(2001)
Third Assessment Report: Climate Change
, pp. 353
-
-
-
18
-
-
34247370602
-
-
Intergovernmental Panel on Climate Change (IPCC).; Cambridge University Press: Cambridge, U.K.
-
Intergovernmental Panel on Climate Change (IPCC). Climate Change 2007: The Physical Science Basis; Cambridge University Press: Cambridge, U.K., 2007; p 141.
-
(2007)
Climate Change 2007: The Physical Science Basis
, pp. 141
-
-
-
19
-
-
78449251957
-
-
Air Products & Chemicals, Inc,; Air Products & Chemicals: Hometown, PA
-
Corporate Responsibility Report; Air Products & Chemicals, Inc, 2009; Air Products & Chemicals: Hometown, PA, p 20; www.airproducts.com.
-
(2009)
Corporate Responsibility Report
, pp. 20
-
-
-
20
-
-
78449262018
-
-
Kanto Denka, Japan, email communication 10-15-09
-
Imao, S., Kanto Denka, Japan, email communication 10-15-09.
-
-
-
Imao, S.1
-
21
-
-
22644452583
-
Remote microwave plasma source for cleaning chemical vapor deposition chambers
-
Raoux, S.; Tanaka, T.; Bhan, M.; Ponnekanti, H.; Seamons, M.; Deacon, T.; Xia, L.-Q.; Pham, F.; Silvetti, D.; Cheung, D.; Fairbairn, K.; Johnson, A.; Pearce, R.; Langan, J. Remote microwave plasma source for cleaning chemical vapor deposition chambers J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct. 1999, 17 (2)) 477-485
-
(1999)
J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.
, vol.17
, Issue.2
, pp. 477-485
-
-
Raoux, S.1
Tanaka, T.2
Bhan, M.3
Ponnekanti, H.4
Seamons, M.5
Deacon, T.6
Xia, L.-Q.7
Pham, F.8
Silvetti, D.9
Cheung, D.10
Fairbairn, K.11
Johnson, A.12
Pearce, R.13
Langan, J.14
-
22
-
-
0347778912
-
-
International SEMATECH Technology Transfer 98083547B-TR, Sematech: Austin, TX
-
Mendicino, L.; Filipiak, S.; Brown, P. T.; Langan, J.; Ridgeway, R.; Johnson, A.; Pearce, R.; Maroulis, P.; Atherton, A. Evaluation of the Applied Materials uclean Technology for DxZ Chamber Cleans for Perfluorocompound (PFC) Emissions Reductions, International SEMATECH Technology Transfer 98083547B-TR, Sematech: Austin, TX, 1998.
-
(1998)
Evaluation of the Applied Materials uclean Technology for DxZ Chamber Cleans for Perfluorocompound (PFC) Emissions Reductions
-
-
Mendicino, L.1
Filipiak, S.2
Brown, P.T.3
Langan, J.4
Ridgeway, R.5
Johnson, A.6
Pearce, R.7
Maroulis, P.8
Atherton, A.9
-
23
-
-
78449235940
-
-
International SEMATECH Manufacturing Initiative, "Guidelines for Environmental Characterizations of Semiconductor Process Equipment" ISMI Technical Transfer Document 06124825A-ENG, Sematech: Austin, TX
-
International SEMATECH Manufacturing Initiative, "Guidelines for Environmental Characterizations of Semiconductor Process Equipment" ISMI Technical Transfer Document 06124825A-ENG, Sematech: Austin, TX, 2006.
-
(2006)
-
-
|