Characteristics of indium zinc oxide thin films prepared by direct current magnetron sputtering for flexible solar cells

Solar Energy Materials and Solar Cells

Volumn 95, Issue 1, 2011, Pages 264-269

  Xiao, Yu Bin ^a   Kong, Seon Mi ^a   Kim, Eun Ho ^a   Chung, Chee Won ^a  

^a Inha University   (South Korea)

Author keywords

Direct current magnetron sputtering; Flexible substrate; In2O3ZnO film; Transparent conducting oxide

Indexed keywords

DC POWER; DEPOSITED FILMS; DEPOSITION PARAMETERS; DIRECT CURRENT MAGNETRON SPUTTERING; FLEXIBLE SOLAR CELLS; FLEXIBLE SUBSTRATE; GAS PRESSURES; HIGH TRANSMITTANCE; INDIUM ZINC OXIDES; LOW RESISTIVITY; OPTICAL TRANSMISSIONS; PROCESS PARAMETERS; ROOM TEMPERATURE; SUBSTRATE DISTANCE; SYSTEMATIC VARIATION; TRANSPARENT CONDUCTING OXIDE; VISIBLE SPECTRA; ZNO; ZNO FILMS;

ATOMIC FORCE MICROSCOPY; DC POWER TRANSMISSION; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; METALLIC FILMS; OXIDE FILMS; POLYETHYLENE TEREPHTHALATES; SUBSTRATES; THERMOPLASTICS; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

FILM PREPARATION;

EID: 78149358759     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.02.016     Document Type: Conference Paper

References (14)

1. A.C. Arias, L.S. Roman, T. Kugler, R. Toniolo, M.S. Meruvia, and I.A. Hummelgen The use of tin oxide thin films as a transparent electrode in PPV based light-emitting diodes Thin Solid Films 371 2000 201 206
2. F. Zhu, K. Zhang, B.L. Low, S.F. Lim, and S.J. Chua Morphological and electrical properties of indium tin oxide films prepared at a low processing temperature for flexible organic light-emitting devices Materials Science and Engineering B85 2001 114 117
3. D. Vaufrey, M.B. Khalifa, M.P. Besland, J. Tardy, C. Sandu, M.G. Blanchin, and J.A. Roger Electrical and optical characteristics of indium tin oxide thin films deposited by cathodic sputtering for top emitting organic electroluminescent devices Materials Science and Engineering C21 2002 265 271
4. T. Sasabayashi, N. Ito, M. Kon, P.K. Song, K. Ustumi, A. Kajio, and Y. Shigesato Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering Thin Solid Films 445 2003 219 223
5. 2 film deposited on indium zinc oxide substrate Chemistry of Materials 16 2004 493 497
6. V. Teixeira, H.N. Cui, L.J. Meng, E. Fortunato, and R. Martins Amorphous ITO thin films prepared by DC sputtering for electrochromic applications Thin Solid Films 420 2002 70 75
7. H. Ma, J. Cho, and C. Park A study of indium tin oxide thin film deposited at low temperature using facing target sputtering system Surface and Coatings Technology 153 2002 131 137
8. W.J. Jeong, S.K. Kim, and G.C. Park Preparation and characteristic of ZnO thin film with high and low resistivity for an application of solar cell Thin Solid Films 506507 2006 180 183
9. T. Tohsophon, and N. Sirikulrat Effects of step-deposition on structures and properties of transparent conducting aluminum-doped zinc oxide films prepared by DC magnetron sputtering Solar Energy Materials and Solar Cells 90 2006 3444 3448
10. M. Abd-Lefdil, R. Diaz, H. Bihri, M. Ait Aouaj, and F. Rueda Preparation and characterization of sprayed FTO thin films European Physical Journal Applied Physics 38 2007 217 219
11. K. Zhang, F. Zhu, C.H.A. Huan, A.T.S. Wee, and T. Osipowicz Indium-doped zinc oxide films prepared by simultaneous radio-frequency and d.c. magnetron sputtering Surface and Interface Analysis 28 1999 271 274
12. W.J. Lee, Y.K. Fang, J.J. Ho, C.Y. Chen, L.H. Chiou, S.J. Wang, F. Dai, T. Hsieh, R.Y. Tsai, D. Huang, and F.C. Ho Organic light-emitting diode on indium zinc oxide films prepared by ion-assisted deposition/d.c. sputtering system Solid-State Electronics 46 2002 477 480
13. Y.S. Jung, J.Y. Seo, D.W. Lee, and D.Y. Jeon Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film Thin Solid Films 445 2003 63 71
14. D.G. Kim, S. Lee, D.H. Kim, G.H. Lee, and M. Isshiki Temperature dependence of the microstructure and resistivity of indium zinc oxide films deposited by direct current magnetron reactive sputtering Thin Solid Films 516 2008 2045 2049