Screen printed phosphorus diffusion for low-cost and simplified industrial mono-crystalline silicon solar cells

Solar Energy Materials and Solar Cells

Volumn 95, Issue 1, 2011, Pages 14-17

  Kwon, T Y ^a   Yang, D H ^a   Ju, M K ^a   Jung, W W ^a   Kim, S Y ^a   Lee, Y W ^a   Gong, D Y ^a   Yi, J ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Contact resistance; Diffusion paste; Paste doping; Screen printing; Solar cells

Indexed keywords

CRYSTALLINE SILICON SOLAR CELLS; DIFFUSION FURNACE; DOPING PROCESS; DOPING TECHNIQUES; EXPERIMENTAL CONDITIONS; FILL FACTOR; FIRING TEMPERATURE; HIGH EFFICIENCY; HIGH FILL FACTORS; LOW COSTS; P-N JUNCTION; PASTE DOPING; PHOSPHORUS DIFFUSION; SCREEN PRINTING TECHNOLOGY; SCREEN-PRINTED; SI SOLAR CELLS; SIMPLE METHOD; SOURCE MATERIAL; SPIN-ON;

CONTACT RESISTANCE; PHOSPHORUS; PRINTING PRESSES; SCREEN PRINTING; SILICON SOLAR CELLS; SOLAR CELLS;

DIFFUSION;

EID: 78149358427     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.04.055     Document Type: Conference Paper

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