Effects of oxygen addition and treating distance on surface cleaning of ITO glass by a non-equilibrium nitrogen atmospheric-pressure plasma jet

Plasma Chemistry and Plasma Processing

Volumn 30, Issue 5, 2010, Pages 553-563

  Chiang, M H ^a   Liao, K C ^b   Lin, I M ^a   Lu, C C ^a   Huang, H Y ^a   Kuo, C L ^a   Wu, J S ^a   Hsu, C C ^b   Chen, S H ^c  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c INSTITUTE OF NUCLEAR ENERGY RESEARCH   (Taiwan)

Author keywords

Atmospheric pressure plasma jet; DBD; ITO; Quasi pulsed; Surface cleaning

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; DBD; DIELECTRIC BARRIER DISCHARGES; GLASS SURFACES; HYDROPHILIC PROPERTIES; ITO; JET DOWNSTREAM; NON EQUILIBRIUM; NONSTATIONARY; OPERATING CONDITION; ORGANIC CONTAMINANT; OXYGEN ADDITION; PARALLEL PLATES; PHOTO-INDUCED; PULSED POWER SOURCES; QUASI-PULSED; SPATIAL DISTRIBUTION; TWO-REGIME; UV EMISSIONS;

CONTACT ANGLE; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; HYDROPHILICITY; ITO GLASS; NITROGEN; NITROGEN PLASMA; OZONE; PLASMA ACCELERATORS; PLASMA JETS; PULSE GENERATORS; SIZE DISTRIBUTION;

SURFACE CLEANING;

EID: 78049343959     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-010-9237-4     Document Type: Article

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