Effect of low level O2 addition to N2 on surface cleaning by nonequilibrium atmospheric-pressure pulsed remote plasma

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 20-24, 2007, Pages

  Iwasaki, Masahiro ^a   Takeda, Keigo ^a   Ito, Masafumi ^b   Yara, Takuya ^c   Uehara, Tsuyoshi ^c   Hori, Masaru ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b WAKAYAMA UNIVERSITY   (Japan)

^c SEKISUI CHEMICAL CO LTD   (Japan)

Author keywords

Atmospheric pressure plasma; Indium tin oxide; Large area process; Low gas temperature; Nonequilibrium plasma; O2 N2; Oxygen radical; Plasma cleaning process; Pulsed plasma

Indexed keywords

ATMOSPHERIC PRESSURE; CLEANING; GROUND STATE; IMPURITIES; OXIDATION; PLASMA APPLICATIONS;

ATMOSPHERIC-PRESSURE PLASMA; INDIUM TIN OXIDE; LOW GAS TEMPERATURE; NONEQUILIBRIUM PLASMA; OXYGEN RADICAL; PLASMA CLEANING PROCESS;

OXYGEN;

EID: 34547838393     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L540     Document Type: Article

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