The kinetics of copper island growth on ruthenium oxide in perchlorate solution

Electrochimica Acta

Volumn 55, Issue 28, 2010, Pages 8416-8421

  Guo, Lian ^a   Thompson, Alexander ^a   Searson, Peter C ^a  

^a Johns Hopkins University   (United States)

Author keywords

Copper deposition; Electrodeposition; Island growth; Nucleation and growth

Indexed keywords

AMORPHOUS SUBSTRATE; ANION ADSORPTION; AVRAMI ANALYSIS; COPPER DEPOSITION; ISLAND GROWTH; ISLAND SIZE; KINETIC REGIME; LATERAL GROWTH; NUCLEATION AND GROWTH; PERCHLORATE SOLUTIONS; POWER-LAW KINETICS; RUTHENIUM OXIDE; SPATIAL DISTRIBUTION; SPECIFIC ANION ADSORPTION; SULFATE SOLUTIONS; SURFACE ORIENTATION; TIME-DEPENDENT; VERTICAL DIRECTION;

ADSORPTION; COPPER; ELECTRODEPOSITION; NUCLEATION; RUTHENIUM; RUTHENIUM COMPOUNDS;

GROWTH KINETICS;

EID: 78049250283     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.07.034     Document Type: Article

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