Electrodeposition and chemical bath deposition of functional nanomaterials

MRS Bulletin

Volumn 35, Issue 10, 2010, Pages 743-750

  Switzer, Jay A ^a   Hodes, Gary ^b  

^a MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

^b WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; ELECTRODEPOSITION; ELECTRODES; MAGNETIC MATERIALS; NANORODS; NANOSTRUCTURED MATERIALS; PROCESSING; SURFACE REACTIONS; VACUUM APPLICATIONS;

APPLIED POTENTIALS; CHEMICAL-BATH DEPOSITION; FUNCTIONAL NANO MATERIALS; GROWTH MECHANISMS; LOW PROCESSING TEMPERATURE; NEAR ROOM TEMPERATURE; SOLUTION ADDITIVES; SOLUTION-PROCESSING;

NANOCOMPOSITE FILMS;

EID: 77958519275     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/s0883769400051253     Document Type: Article

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