Resistance switching in electrodeposited magnetite superlattices

Journal of the American Chemical Society

Volumn 132, Issue 4, 2010, Pages 1258-1260

  Switzer, Jay A ^a   Gudavarthy, Rakesh V ^a   Kulp, Elizabeth A ^a   Mu, Guojun ^a   He, Zhen ^a   Wessel, Andrew J ^a  

^a MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED POTENTIALS; AU(1 1 1 ); FERRITE SYSTEMS; HIGH-TO-LOW; LOW-TO-HIGH; NANO LAYERS; RESISTANCE SWITCHING; RESISTIVE RANDOM ACCESS MEMORY;

CORROSION; DEFECTS; ELECTRODEPOSITION; EPITAXIAL FILMS; GOLD; IRON COMPOUNDS; MAGNETITE; OXIDE MINERALS; RANDOM ACCESS STORAGE;

SUPERLATTICES;

GOLD; IRON OXIDE; MAGNETITE; SILVER CHLORIDE; ZINC COMPLEX;

ARTICLE; CONDUCTANCE; DEVICE; ELECTRIC FIELD; ELECTROCHEMISTRY; ELECTRODE; MOLECULAR INTERACTION; RAMAN SPECTROMETRY; RESISTIVE RANDOM ACCESS MEMORY DEVICE; SCANNING TRANSMISSION ELECTRON MICROSCOPY; STOICHIOMETRY; TECHNOLOGY; TRANSITION TEMPERATURE; X RAY DIFFRACTION;

EID: 77950456875     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja909295y     Document Type: Article

References (20)

1. (a) Waser, R.; Aono, M. Nat. Mater. 2007, 6, 833-840.
2. (b) Sawa, A. Mater. Today 2008, 11, 28-36.
3. (c) Szot, K.; Speier, W.; Bihlmayer, G.; Waser, R. Nat. Mater. 2006, 5, 312-320.
4. (d) Yang, Y. C.; Pan, F.; Liu, Q.; Liu, M.; Zeng, F. Nano Lett. 2009, 9, 1636-1643.
5. (a) Lee, S.; Fursina, A.; Mayo, J. T.; Yavuz, C. T.; Colvin, V. L.; Sofin, R. G. S.; Shvets, I. V.; Natelson, D. Nat. Mater. 2008, 7, 130-133.
6. (b) Fursina, A. A.; Sofin, R. G. S.; Shvets, I. V.; Natelson, D. Phys. Rev. B 2009, 79, 245131/1-245131/6.
7. Verwey, E. J. W. Nature 1939, 144, 327-328.
8. (a) Switzer, J. A.; Hung, C.-J.; Breyfogle, B. E.; Shumsky, M. G.; Van Leeuwen, R.; Golden, T. D. Science 1994, 264, 1573-1576.
9. (b) Switzer, J. A.; Shane, M. J.; Phillips, R. J. Science 1990, 247, 444-446.
10. (c) Kothari, H. M.; Vertegel, A. A.; Bohannan, E. W.; Switzer, J. A. Chem. Mater. 2002, 14, 2750-2756.
11. (a) Kulp, E. A.; Kothari, H. M.; Limmer, S. J.; Yang, J.; Gudavarthy, R. V.; Bohannan, E. W.; Switzer, J. A. Chem. Mater. 2009, 21, 5022-5031.
12. (b) Kothari, H. M.; Kulp, E. A.; Limmer, S. J.; Poizot, P.; Bohannan, E. W.; Switzer, J. A. J. Mater. Res. 2006, 21, 293-301.
13. Bard, A. J.; Faulkner, L. R. Electrochemical Methods: Fundamentals and Applications; Wiley: New York, 2001; p 340.
14. (a) Burch, T. J.; Craig, P. P.; Hedrick, C.; Kitchens, T. A.; Budnick, J. I.; Cannon, J. A.; Lipsicas, M.; Mattis, D. Phys. Rev. Lett. 1969, 23, 1444-1447.
15. (b) Freud, P. J.; Hed, A. Z. Phys. Rev. Lett. 1969, 23, 1440-1443.
16. (a) Odagawa, A.; Katoh, Y.; Kanzawa, Y.; Wei, Z.; Mikawa, T.; Muraoka, S.; Takagi, T. Appl. Phys. Lett. 2007, 91, 133503/1-133503/3.
17. (b) Kim, T. H.; Jang, E. Y.; Lee, N. J.; Choi, D. J.; Lee, K.-J.; Jang, J.-T.; Choi, J.-S.; Moon, S. H.; Cheon, J. Nano Lett. 2009, 9, 2229-2233.
18. (a) Piekarz, P.; Parlinski, K.; Oles, A. M. Phys. Rev. Lett. 2006, 97, 156402/ 1-156402/4.
19. (b) Huang, D. J.; Lin, H.-J.; Okamoto, J.; Chao, K. S.; Jeng, H.-T.; Guo, G. Y.; Hsu, C.-H.; Huang, C.-M.; Ling, D. C.; Wu, W. B.; Yang, C. S.; Chen, C. T. Phys. Rev. Lett. 2006, 96, 096401/1-096401/4.
20. Sugimoto,N.;Onoda,S.;Nagaosa,N.Phys.Rev.B2008,78, 155104/1-155104/5.