Magnetotransport properties of electrodeposited bismuth films

Journal of Physical Chemistry C

Volumn 112, Issue 31, 2008, Pages 12018-12023

  O'Brien, B ^b   Plaza, M ^c   Zhu, L Y ^a   Perez, L ^c   Chien, C L ^a   Searson, P C ^b  

^a JOHNS HOPKINS UNIVERSITY   (United States)

^b Johns Hopkins University   (United States)

^c UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; BISMUTH FILMS; BISMUTH NITRATES; BISMUTH THIN FILMS; DEPOSITION POTENTIALS; FILM MORPHOLOGY; FILM-THICKNESS; GRAIN SIZES; MAGNETO-TRANSPORT PROPERTIES; MEAN FREE PATH; PATTERNED FEATURES; POLY-CRYSTALLINE; SEMI METALS; STRUCTURE-PROPERTY RELATIONSHIPS;

BISMUTH; BISMUTH PLATING; CONCENTRATION (PROCESS); COPPER PLATING; ELECTRIC RESISTANCE; ERROR ANALYSIS; GOLD; MAGNETIC FIELD EFFECTS; MAGNETIC FIELDS; MAGNETIC FILMS; MAGNETOELECTRONICS; MAGNETORESISTANCE; METALS; NITRATES; THICK FILMS; TRANSPORT PROPERTIES;

MOLECULAR BEAM EPITAXY;

EID: 49649099482     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp802802j     Document Type: Article

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