In situ methods to explore microstructure evolution in chemically derived oxide thin films

Journal of Materials Research

Volumn 25, Issue 3, 2010, Pages 427-436

  Aygün, Seymen M ^a   Daniels, Patrick ^a   Borland, William J ^a   Maria, Jon Paul ^b  

^a North Carolina State University   (United States)

^b DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

A-DENSITY; ATMOSPHERIC ANALYSIS; CHEMICAL SOLUTIONS; CRYSTALLIZATION REACTION; GRAIN SIZE; IN-SITU; IN-SITU ANALYSIS; IN-SITU METHODS; MICROSTRUCTURE EVOLUTIONS; OPTIMIZED STRUCTURES; OXIDE THIN FILMS; OXYGEN PARTIAL PRESSURE; PRECURSOR DECOMPOSITION; PRECURSOR GELS; PROCESSING PARAMETERS; RAMP RATES; RESIDUAL GAS ANALYZERS; TEMPERATURE RANGE; VOLATILE COMPONENTS; VOLUME CONTRACTION;

BARIUM COMPOUNDS; CAPACITORS; CRYSTALLIZATION; GRAIN SIZE AND SHAPE; MICROSTRUCTURE; OPTIMIZATION; OXIDE FILMS; OXYGEN;

IN SITU PROCESSING;

EID: 77958097174     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2010.0066     Document Type: Article

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