Hybrid plasmon/dielectric waveguide for integrated silicon-on-insulator optical elements

Optics Express

Volumn 18, Issue 20, 2010, Pages 21013-21023

  Flammer, P D ^a   Banks, J M ^a   Furtak, T E ^a   Durfee, C G ^a   Hollingsworth, R E ^b   Collins, R T ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

^b ITN ENERGY SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON COMPOUNDS; SURFACE ROUGHNESS; WAVEGUIDES;

ACTIVE DEVICES; EXPERIMENTAL VERIFICATION; LOW SENSITIVITY; METALLIC LOSS; MICRON SCALE; OPTICAL ELEMENTS; POLARIZATION WAVEGUIDES; PROCESSING TECHNIQUE; PROPAGATION LENGTHS; SILICON CHIP; SILICON ON INSULATOR; SILICON ON INSULATOR WAFERS; SINGLE MODE; SUBMICRON SCALE; WAVEGUIDE STRUCTURE;

SILICON WAFERS;

EID: 77958011873     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.021013     Document Type: Article

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