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Applied Physics B: Lasers and Optics

Volumn 81, Issue 5, 2005, Pages 691-694

Improvement of sidewall surface roughness in silicon-on-insulator rib waveguides

(5) Gao, F a Wang, Y a Cao, G a Jia, X a Zhang, F a

a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; INDUCTIVELY COUPLED PLASMA; LIGHT SCATTERING; OXIDATION; SCANNING ELECTRON MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY; THERMOANALYSIS; WAVEGUIDES;

INDUCTIVE COUPLED PLASMA REACTIVE ION ETCHING (ICPRIE); RESIDUAL SIDEWALL ROUGHNESS; ROOT MEAN SQUARE (RMS) ROUGHNESS; SCATTERING LOSS;

SURFACE ROUGHNESS;

EID: 25144513071 PISSN: 09462171 EISSN: None Source Type: Journal
DOI: 10.1007/s00340-005-1951-x Document Type: Article

Times cited : (23)

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