SEMATECH EUVL mask program status

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Yun, Henry ^a   Goodwin, Frank ^b   Huh, Sungmin ^b   Orvek, Kevin ^a   Cha, Brian ^b   Rastegar, Abbas ^b   Kearney, Patrick ^b  

^a INTEL CORPORATION   (United States)

^b SEMATECH   (United States)

Author keywords

EUVL; Mask Blank Development Center; Mask Infrastructure; SEMATECH

Indexed keywords

COLLABORATIVE EFFORTS; CRITICAL ISSUES; DEFECT REDUCTION; DEFECT-FREE; EUV BLANK; EUV MASK; EUV MASK BLANKS; EUV RESISTS; EUVL; HIGH VOLUME MANUFACTURING; INFRASTRUCTURE INVESTMENT; INTERNATIONAL CONSORTIUM; INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS; KEY ISSUES; MANUFACTURABILITY; MASK BLANK DEVELOPMENT CENTER; MASK BLANK DEVELOPMENT CENTERS; MASK INFRASTRUCTURE; MASK TECHNOLOGY; PANASONIC; PILOT LINE; RECENT STATUS; ROAD MANAGEMENT; SAMSUNG; SEMATECH; SEMI-CONDUCTOR MARKET; STRATEGIC DIRECTION; TECHNOLOGY NODES; TRACK RECORD;

DISTRIBUTED COMPUTER SYSTEMS; HIGHWAY ENGINEERING; INVESTMENTS; MASKS; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGICAL FORECASTING; TECHNOLOGY; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 69949136467     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824257     Document Type: Conference Paper

References (3)

1. B. La Fontaine, et. al., "The use of EUV Lithography to Produce Demonstration Devices", Proceedings of SPIE 6921, 2008
2. A. Rastegar et. al., "Nanopit Smoothing by Cleaning", Proceedings of SPIE 7271, 2009
3. P. Kearney, et. al., "Ion Beam Deposition for Defect-Free EUVL Mask Blanks", Proceedings of SPIE 6921, 2008.