Formation of ruthenium-tin nanoparticles on Al2O 3/Ni3Al(111) from an organometallic precursor

Journal of Physical Chemistry C

Volumn 114, Issue 40, 2010, Pages 17062-17068

  Uhl, Alexander ^a   Lei, Yu ^b   Khosravian, Homa ^b   Becker, Conrad ^c,d   Wandelt, Klaus ^c   Adams, Richard D ^e   Trenary, Michael ^a   Meyer, Randall J ^b  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

^b University of Illinois at Chicago   (United States)

^c UNIVERSITY OF BONN   (Germany)

^d CNRS   (France)

^e UNIVERSITY OF SOUTH CAROLINA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION PROPERTIES; MONOLAYER THICKNESS; ORGANOMETALLIC COMPOUNDS; ORGANOMETALLIC PRECURSORS; ROOM TEMPERATURE; SAMPLE SURFACE; STATIC ADSORPTION; SURFACE AREA; SURFACE OXIDATIONS; SURFACE PATCHES; TIN NANOPARTICLES; ULTRAHIGH VACUUM CONDITIONS;

ADSORPTION; HEATING; LIGANDS; MONOLAYERS; ORGANOMETALLICS; OXIDE FILMS; RUTHENIUM; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTALS; SPHERES; TIN; TITANIUM COMPOUNDS;

ALUMINUM;

EID: 77957877344     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp103462u     Document Type: Article

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