Determination of the coincidence lattice of an ultra thin Al 2O3 film on Ni3Al(1 1 1)

Surface Science

Volumn 576, Issue 1-3, 2005, Pages

  Degen, S ^a   Krupski, A ^a   Kralj, M ^a   Langner, A ^a   Becker, C ^a   Sokolowski, M ^a   Wandelt, K ^a  

^a UNIVERSITY OF BONN   (Germany)

Author keywords

Aluminum; Aluminum oxide; Coincidence lattice; Nickel; SPA LEED; STM; Thin film

Indexed keywords

ALUMINUM; CMOS INTEGRATED CIRCUITS; LATTICE CONSTANTS; LOW ENERGY ELECTRON DIFFRACTION; NICKEL; RAPID THERMAL ANNEALING; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTALS; THERMOOXIDATION; ULTRAHIGH VACUUM;

ALUMINUM OXIDE; COINCIDENCE LATTICE; SPA-LEED; SUPERSTRUCTURE;

THIN FILMS;

EID: 12544251541     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.12.020     Document Type: Article

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