Growth of copper and vanadium on a thin Al2O3-film on Ni3Al(111)

Thin Solid Films

Volumn 400, Issue 1-2, 2001, Pages 71-75

  Wiltner, A ^a   Rosenhahn, A ^a   Schneider, J ^a   Becker, C ^a   Pervan, P ^b   Milun, M ^b   Kralj, M ^b   Wandelt, K ^a  

^a UNIVERSITY OF BONN   (Germany)

^b UNIVERSITY OF ZAGREB   (Croatia)

Author keywords

Alumina films; Copper; Growth; Scanning tunneling microscopy (STM); Vanadium

Indexed keywords

ALUMINA; COPPER; DEPOSITION; HIGH TEMPERATURE EFFECTS; MOLECULAR ORIENTATION; NICKEL COMPOUNDS; NUCLEATION; SCANNING TUNNELING MICROSCOPY; THIN FILMS; VANADIUM;

ALUMINA FILMS;

GROWTH (MATERIALS);

EID: 0035803272     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01453-5     Document Type: Conference Paper

References (11)