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Volumn , Issue , 2010, Pages 340-343

High-Q integrated CMOS-MEMS resonators with Deep-submicron gaps

Author keywords

[No Author keywords available]

Indexed keywords

CMOS AMPLIFIERS; CMOS-MEMS; DEEP SUB-MICRON; DIE AREA; DIRECT MEASUREMENT; ENHANCED TRANSMISSION; FREE-FREE BEAM; FREQUENCY VARIATION; GAP SPACING; MECHANICAL BOUNDARIES; MINIMUM FEATURE SIZES; MONOLITHICALLY INTEGRATED; MOTIONAL IMPEDANCE; PULL-IN; READOUT CIRCUITRY; RESONANCE FREQUENCIES; SINGLE-CHIP;

EID: 77957865433     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/FREQ.2010.5556316     Document Type: Conference Paper
Times cited : (3)

References (5)
  • 2
    • 27544512689 scopus 로고    scopus 로고
    • Integrated HF CMOS-MEMS square-frame resonators with on-chip electronics and electrothermal narrow gap mechanism
    • Seoul, Korea, June
    • C.-C. Lo, F. Chen, and G. K. Fedder, "Integrated HF CMOS-MEMS square-frame resonators with on-chip electronics and electrothermal narrow gap mechanism," Tech. Digest, Transducers'05, Seoul, Korea, pp. 2074-2077, June, 2005.
    • (2005) Tech. Digest, Transducers'05 , pp. 2074-2077
    • Lo, C.-C.1    Chen, F.2    Fedder, G.K.3
  • 5
    • 77952758508 scopus 로고    scopus 로고
    • Realizing deepsubmicron gap spacing for CMOS-MEMS resonators with frequency tuning capability via modulated boundary conditions
    • HongKong, Jan.
    • W.-C. Chen, M.-H. Li, W. Fang, and S.-S. Li, "Realizing deepsubmicron gap spacing for CMOS-MEMS resonators with frequency tuning capability via modulated boundary conditions," IEEE International Conference on Microelectromechanical Systems (MEMS 2010), HongKong, pp. 735-738, Jan, 2010.
    • (2010) IEEE International Conference on Microelectromechanical Systems (MEMS 2010) , pp. 735-738
    • Chen, W.-C.1    Li, M.-H.2    Fang, W.3    Li, S.-S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.