Optical and electrical properties of lithium doped nickel oxide films deposited by spray pyrolysis onto alumina substrates

Journal of Crystal Growth

Volumn 312, Issue 22, 2010, Pages 3276-3281

  Garduno I A ^a   Alonso, J C ^a   Bizarro, M ^a   Ortega, R ^b   Rodrguez Fernndez, L ^b   Ortiz, A ^a  

^a Universidad Nacional Autnoma de Mxico   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

A1. Characterization; A3. Spray pyrolysis; B1. Metal oxides; B2. Semiconducting materials

Indexed keywords

A1. CHARACTERIZATION; A3. SPRAY PYROLYSIS; ALUMINA SUBSTRATES; B1. METAL OXIDES; CRYSTALLINE FILMS; CRYSTALLINE STRUCTURE; CUBIC PHASE; CURRENT-VOLTAGE MEASUREMENTS; DEPOSITED FILMS; DOPED FILMS; DOPING CONCENTRATION; ELECTRICAL RESISTIVITY; ENERGY BANDGAPS; GRAIN SIZE; HIGH SUBSTRATE TEMPERATURE; HOT POINT; LITHIUM ACETATE; NON-DOPED; OPTICAL AND ELECTRICAL PROPERTIES; P TYPE SEMICONDUCTOR; PYROLYSIS PROCESS; SEMICONDUCTING MATERIALS; SOURCE MATERIAL;

CONCENTRATION (PROCESS); CRYSTALLINE MATERIALS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; FILM PREPARATION; LITHIUM; NICKEL; NICKEL OXIDE; ORGANOMETALLICS; OXIDE FILMS; QUARTZ; SUBSTRATES;

SPRAY PYROLYSIS;

EID: 77957827331     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2010.08.020     Document Type: Article

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