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Thin Solid Films

Volumn 519, Issue 1, 2010, Pages 1-4

Highly (100)-oriented CeO2 films prepared on amorphous substrates by laser chemical vapor deposition

(4) Vargas Garcia, J R a Beltran Romero, L a Tu, R a Goto, T a

a TOHOKU UNIVERSITY (Japan)

Author keywords

Cerium oxide; Laser chemical vapor deposition; Oriented films; Transmission electron microscopy; X ray diffraction

Indexed keywords

AMORPHOUS SILICA; AMORPHOUS SUBSTRATE; CERIUM OXIDES; FEATHER-LIKE STRUCTURE; FLAT-TOP; HIGH DEPOSITION RATES; INGAALAS; LASER CHEMICAL VAPOR DEPOSITION; LASER POWER; LASER SPOT SIZE; LASER SYSTEMS; NANO-SIZED; ORIENTED FILMS; TRANSMISSION ELECTRON;

AMORPHOUS FILMS; CERIUM; CERIUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; DIFFRACTION; FILM PREPARATION; OXIDE FILMS; SEMICONDUCTOR LASERS; SILICA; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

LASER CHEMISTRY;

EID: 77957722167 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.06.057 Document Type: Article

Times cited : (21)

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