Effect of indium doping in CdO thin films prepared by spray pyrolysis technique

Journal of Physics and Chemistry of Solids

Volumn 71, Issue 11, 2010, Pages 1545-1549

  Kumaravel, R ^a   Ramamurthi, K ^a   Krishnakumar, V ^b  

^a BHARATHIDASAN UNIVERSITY   (India)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

A. Thin films; C. X ray diffraction; D. Electrical properties; D. Optical properties

Indexed keywords

A. THIN FILMS; BAND-GAP VALUES; C. X-RAY DIFFRACTION; CDO FILMS; CDO THIN FILMS; CRYSTALLOGRAPHIC DIRECTIONS; D. OPTICAL PROPERTIES; DOPING CONCENTRATION; ELECTRICAL , OPTICAL AND STRUCTURAL PROPERTIES; ELECTRICAL PROPERTY; GLASS SUBSTRATES; HALL MEASUREMENTS; HIGH TRANSMITTANCE; INDIUM DOPING; OPTICAL TRANSMISSIONS; PACKING DENSITY; SCANNING ELECTRON MICROSCOPE; SPRAY PYROLYSIS METHOD; SPRAY SOLUTIONS; SPRAY-PYROLYSIS TECHNIQUES; UNDOPED FILMS;

CADMIUM COMPOUNDS; CARRIER CONCENTRATION; CONCENTRATION (PROCESS); CONDUCTIVE FILMS; DIFFRACTION; DOPING (ADDITIVES); ELECTRIC PROPERTIES; FILM PREPARATION; INDIUM; LIGHT TRANSMISSION; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SPRAY PYROLYSIS; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAYS;

OPTICAL FILMS;

EID: 77957321281     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2010.07.021     Document Type: Article

References (40)

1. H.L. Hartangel, A.L. Dawar, A.K. Jain, and C. Jagadish Semiconducting Transparent Thin Films 1995 Institute of Physics London
2. J.S. Kim, M. Granstrm, R.H. Friend, N. Johansson, W.R. Salaneck, R. Daik, and W.J. Feast J. Appl. Phys. 84 1998 6859
3. T. Minami, T. Kakumu, and S. Tanaka J. Vac. Sci. Technol. A 14 1996 1704
4. A.J. Freeman, K.R. Poeppelmeier, T.O. Mason, R.P.H. Chang, and T.J. Marks MRS Bull. 25 2000 45
5. H. Hosono, H. Ohta, M. Orita, K. Ueda, and M. Hirano Vacuum 66 2002 419
6. D.S. Ginley, and C. Bright MRS Bull. 25 2000 15
7. T.J. Coutts, D.L. Young, X. Li, W.P. Mulligan, and X. Wu J. Vac. Sci. Technol. A 18 2000 2646
8. N. Ueda, H. Maeda, H. Hosono, and H. Kawazoe J. Appl. Phys. 84 1998 6174
9. Z.Y. Zhao, D.L. Morel, and C.S. Ferekides Thin Solid Films 413 2002 203
10. M. Yan, M. Lane, C.R. Kannewurf, and R.P.H. Chang Appl. Phys. Lett. 78 2001 2342
11. F.P. Koffyberg Phys. Rev. B 13 1976 4470
12. E. Burstein Phys. Rev. 93 1954 632
13. A. Wang, J.R. Bancock, N.L. Edleman, A.W. Metz, M.A. Lane, R. Asahi, V.P. Dravid, C.R. Kannewurf, A.J. Freeman, and T.J. Marks Proc. Natl. Acad. Sci. USA. 98 2001 7113
14. Y. Yang, S. Jin, J.E. Medvedeva, J.R. Ireland, A.W. Metz, J. Ni, M.C. Hersam, A.J. Freeman, and T.J. Marks J. Am. Chem. Soc. 127 2005 8796
15. A.A. Dakhel, and F.Z. Henari Cryst. Res. Technol. 38 2003 979
16. G. Phatak, and R. Lal Thin Solid Films 245 1994 17
17. S. Aksoy, Y. Caglar, S. Ilican, and M. Caglar Int. J. Hydrogen Energy 34 2009 5191
18. R. Maity, and K.K. Chattopadhyay Sol. Energy Mater. Sol. Cells 90 2006 597
19. A. Verkey, and A.F. Fort Thin Solid Films 239 1994 211
20. T.K. Subramanyam, B.R. Krishna, S. Uthanna, B.S. Naidu, and P.J. Reddy Vacuum 48 1997 565
21. R.R. Salunkhe, D.S. Dhawale, D.P. Dubal, and C.D. Lokhande Sensors Actuators B 140 2009 86
22. R.A. Ismail J. Mater. Sci.: Mater. Electron. 20 2009 1219
23. K. Gurumurugan, D. Mangalraj, and S.K. Narayandass Thin Solid Films 251 1994 7
24. L.R. Gutierrez, J.J.C. Romero, J.M.P. Tapia, E.B. Calva, J.C.M. Flores, and M.O. Lopez Mater. Lett. 60 2006 3866
25. A.W. Metz, J.R. Ireland, J.G. Zheng, R.P.S.M. Lobo, Y. Yangm, J. Li, C.L. Stern, V.P. Dravid, N. Bontemps, C.R. Kannewurf, K.R. Poeppelmeier, and T.J. Marks J. Am. Chem. Soc. 126 2004 8477
26. S. Jin, Y. Yang, J.E. Medvedeva, J.R. Ireland, A.W. Metz, J. Ni, C.R. Kannewurf, A.J. Freeman, and T.J. Marks J. Am. Chem. Soc. 126 2004 13787
27. R.K. Gupta, K. Ghosh, R. Patel, S.R. Mishra, and P.K. Kahol Mater. Lett. 62 2008 3373
28. R.K. Gupta, K. Ghosh, R. Patel, and P.K. Kahol Appl. Surf. Sci. 255 2009 6252
29. R.K. Gupta, K. Ghosh, R. Patel, S.R. Mishra, and P.K. Kahol Curr. Appl. Phys. 9 2009 673
30. E. Elangovan, and K. Ramamurthi J. Optoelectron. Adv. Mater. 5 2003 45
31. JCPDS-International Centre for Diffraction Data, Card No. 05-0640, 1997.
32. S. Jin, Y. Yang, J.E. Medvedeva, J.R. Ireland, A.W. Metz, J. Ni, C.R. Kannewurf, A.J. Freeman, and T.J. Marks J. Am. Chem. Soc. 126 2004 13787
33. C. Agashe, and S. Mahamuni Semicond. Sci. Technol. 10 1995 172
34. C. Agashe, M.G. Takwale, V.G. Bhide, S. Mahamuni, and S.K. Kulkarni J. Appl. Phys. 70 1991 7382
35. T. Koida, and M. Kondo J. Appl. Phys. 101 2007 0637131
36. S. Jin, Y. Yang, J.E. Medvedeva, L. Wang, S. Li, N. Cortes, J.R. Ireland, A.W. Metz, J. Ni, M.C. Hersam, A.J. Freeman, and T.J. Marks Chem. Mater. 20 2008 220
37. V.R. Shinde, T.P. Gujar, C.D. Lokhande, R.S. Mane, and S.H. Han Mater. Chem. Phys. 96 2006 326
38. S. Kose, F. Atay, V. Bilgin, and I. Akyuz Int. J. Hydrogen Energy 34 2009 5260
39. M.A. Flores, R. Castanedo, G. Tornes, and O. Zelaya Sol. Energy Mater. Sol. Cells 93 2009 28
40. B.J. Zheng, J.L. Lian, L. Zhao, and Q. Jiang Appl. Surf. Sci. 256 2010 2910