Influence of oxygen pressure on the physical properties of dc magnetron reactive sputtered cadmium oxide films

Vacuum

Volumn 48, Issue 6, 1997, Pages 565-569

  Subramanyam, T K ^a   Radha Krishna, B ^a   Uthanna, S ^a   Naidu, B S ^a   Reddy, P J ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY OF SOLIDS; ENERGY GAP; HALL EFFECT; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; PRESSURE EFFECTS; SEMICONDUCTING CADMIUM COMPOUNDS; SPUTTER DEPOSITION; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

HALL MOBILITY; REACTIVE SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0031152986     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00019-5     Document Type: Article

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