Influence of target-substrate distance and sputtering power on chromium oxide films prepared by medium-frequency magnetron sputtering

Wuhan University Journal of Natural Sciences

Volumn 15, Issue 5, 2010, Pages 440-443

  Yang, Huijuan ^a   He, Jun ^a   Tian, Canxin ^a   Liu, Chuansheng ^a   Fu, Dejun ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

chromium oxide; hardness; magnetron sputtering; microstructure

Indexed keywords

EID: 77957241880     PISSN: 10071202     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11859-010-0680-0     Document Type: Article

References (11)

1. x films synthesized by a cathodic arc evaporation process[J]. Thin Solid Films, 2008, 516(16): 5536-5540.
2. Bhushan B, Theunissen G S, Li X. Tribological studies of chromium oxide films for magnetic recording applications[J]. Thin Solid Films, 1997, 311(1-2): 67-80.
3. Barshilia H C, Rajam K S. Growth and characterization of chromium oxide coatings prepared by pulsed-direct current reactive unbalanced magnetron sputtering[J]. Applied Surface Science, 2008, 255(5): 2925-2931.
4. Hones P, Diserens M, Levy F. Characterization of sputter-deposited chromium oxide thin films[J]. Surface and Coatings Technology, 1999, 120-121: 277-283.
5. Hong R J, Jiang X, Szyszka B, et al. Studies on ZnO: Al thin films deposited by in-line reactive mid-frequency magnetron sputtering[J]. Applied Surface Science, 2003, 207: 341-350.
6. Cheng H E, Lin T C, Chen W C. Preparation of [002] oriented AlN thin films by mid frequency reactive sputtering technique[J]. Thin Solid Films, 2003, 425: 85-89.
7. Natarajan G, Daniels S, Cameron D C, et al. Influence of target to substrate distance on the sputtered CuCl film properties[J]. Thin Solid Films, 2008, 516(16): 5531-5535.
8. 2 nanostructures deposited by radio-frequency magnetron sputtering: Correlations between plasma species and thin film composition, structural and microstructural properties[J]. Thin Solid Films, 2007, 515(13): 5314-5323.
9. 2 thin films[J]. Thin Solid Films, 2008, 517(3): 1091-1095.
10. Cheng H, Hing P. The evolution of preferred orientation and morphology of AlN films under various RF sputtering powers[J]. Surface and Coatings Technology, 2003, 167(2-3): 297-301.
11. Sayago I, Aleixandre M, Arés L, et al. The effect of the oxygen concentration and the RF power on the zinc oxide films properties deposited by magnetron sputtering[J]. Applied Surface Science, 2005, 245(1-4): 273-280.