Influence of target to substrate distance on the sputtered CuCl film properties

Thin Solid Films

Volumn 516, Issue 16, 2008, Pages 5531-5535

  Natarajan, Gomathi ^a   Daniels, S ^a   Cameron, D C ^b   McNally, P J ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

CuCl; Sputtering; Wide band gap semiconductor

Indexed keywords

COPPER COMPOUNDS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OPTOELECTRONIC DEVICES; PHOTOLUMINESCENCE; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EXCITON MEDIATED SHARP UV LUMINESCENCE; OPTIMUM SPACING; SPUTTERED FILMS; STOICHIOMETRIC FILMS; SUBSTRATE DISTANCE; WIDE BAND GAP SEMICONDUCTORS;

THIN FILMS;

EID: 43949125815     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.112     Document Type: Article

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