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Journal of Vacuum Science and Technology B

Volumn 28, Issue 4, 2010, Pages 720-723

Effect of rapid thermal annealing on Mgx Zn1-x O films prepared by radio-frequency magnetron sputtering

(5) Hsueh, Kuang Po a Tun, Chun Ju b Chiu, Hsien Chin c Huang, Yu Ping d Chi, Gou Chung d

a VANUNG UNIVERSITY (Taiwan)

b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER (Taiwan)

c CHANG GUNG UNIVERSITY (Taiwan)

d NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; RADIO WAVES; RAPID THERMAL ANNEALING; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC ALLOYS; ZINC OXIDE; ZINC SULFIDE;

AS-GROWN; HIGH THERMAL; RADIO-FREQUENCY MAGNETRON SPUTTERING SYSTEM; RADIO-FREQUENCY-MAGNETRON SPUTTERING; SINGLE PHASIS; THERMAL-ANNEALING; TWO PHASE; X-RAY PHOTOELECTRON SPECTROSCOPY SPECTRA; X-RAY PHOTOELECTRONS; ZNO FILMS;

II-VI SEMICONDUCTORS;

EID: 77957227906 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3442476 Document Type: Conference Paper

Times cited : (13)

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