Ferromagnetic Cu and Al doped ZnO thin films by PLD

Journal of Physics: Conference Series

Volumn 200, Issue SECTION 7, 2010, Pages

  Karamat, S ^a   Rawat, R S ^a   Lee, P ^a   Tan, T L ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CONDUCTIVE FILMS; COPPER; DEPOSITION; FERROMAGNETIC MATERIALS; FERROMAGNETISM; HEAVY IONS; MAGNETISM; POINT DEFECTS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

AL DOPED ZNO THIN FILMS; COMPOSITIONAL ANALYSIS; CRYSTALLINE FILMS; FERROMAGNETIC BEHAVIORS; IMPURITY PHASE; ION SUBSTITUTION; PLD TECHNIQUE; SI SUBSTRATES;

THIN FILMS;

EID: 77957088169     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/200/7/072045     Document Type: Conference Paper

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