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Volumn 26, Issue C, 2000, Pages 47-71

Interfacial cracking in thin film structures

Author keywords

Cross Sectional Nanoindentation; interface toughness; Microelectronics reliability; thin films

Indexed keywords


EID: 77957076139     PISSN: 15661369     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S1566-1369(00)80042-4     Document Type: Article
Times cited : (8)

References (92)
  • 5
    • 0032317689 scopus 로고    scopus 로고
    • Bravman J.C., Marieb T.N., Lloyd J.R., and Korhonen M.A. (Eds), Materials Research Society, Warrendale
    • Liu X.H., Suo Z., Ma Q., and Fujimoto H. In: Bravman J.C., Marieb T.N., Lloyd J.R., and Korhonen M.A. (Eds). Materials Reliability in Microelectronics VIII (1998), Materials Research Society, Warrendale 313-324
    • (1998) Materials Reliability in Microelectronics VIII , pp. 313-324
    • Liu, X.H.1    Suo, Z.2    Ma, Q.3    Fujimoto, H.4
  • 16
    • 0031378033 scopus 로고    scopus 로고
    • Clement J.J., Keller R.R., Krisch K.S., Sanchez Jr. J.E., and Suo Z. (Eds), Materials Research Society, Pittsburgh
    • He M.Y., Xu F., Clarke D.R., Ma Q., and Fujimoto H. In: Clement J.J., Keller R.R., Krisch K.S., Sanchez Jr. J.E., and Suo Z. (Eds). Materials Reliability in Microelectronics VII (1997), Materials Research Society, Pittsburgh 15-26
    • (1997) Materials Reliability in Microelectronics VII , pp. 15-26
    • He, M.Y.1    Xu, F.2    Clarke, D.R.3    Ma, Q.4    Fujimoto, H.5
  • 19
    • 0017918582 scopus 로고
    • Vossen J.L., and Mittal K.L. (Eds)
    • In: Vossen J.L., and Mittal K.L. (Eds). ASTM STP 640 (1978) 122
    • (1978) ASTM STP 640 , pp. 122
  • 28


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.