Structural properties of Al/Mo/SiC multilayerswith high reflectivity for extreme ultraviolet light

Optics Express

Volumn 18, Issue 19, 2010, Pages 20019-20028

  Hu, Min Hui ^a   Le Guen, Karine ^a   André, Jean Michel ^a   Jonnard, Philippe ^a   Meltchakov, Evgueni ^b,c   Delmotte, Franck ^b   Galtayries, Anouk ^b  

^a SORBONNE UNIVERSITÉ   (France)

^b CNRS   (France)

^c UNIVERSITÉ PARIS SUD   (France)

Author keywords

[No Author keywords available]

Indexed keywords

MOLYBDENUM; OPTICAL MULTILAYERS; REFLECTION; SECONDARY ION MASS SPECTROMETRY; SILICON CARBIDE; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

EUV REFLECTIVITY; EXTREME ULTRA-VIOLET LIGHTS; EXTREME ULTRAVIOLETS; HIGH REFLECTIVITY; HIGH-REFLECTIVITY COATINGS; INTERFACIAL ROUGHNESS; MULTILAYER STACKS; MULTILAYER STRUCTURES; NORMAL INCIDENCE; PERIODIC MULTILAYERS; SURFACE STUDY; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TOF SIMS; XPS;

MULTILAYERS;

ALUMINUM; INORGANIC COMPOUND; MOLYBDENUM; SILICON CARBIDE; SILICON DERIVATIVE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; MATERIALS TESTING; OPTICAL INSTRUMENTATION; PHOTOMETRY; REFRACTOMETRY; ULTRAVIOLET RADIATION;

ALUMINUM; CARBON COMPOUNDS, INORGANIC; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LENSES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MOLYBDENUM; PHOTOMETRY; REFRACTOMETRY; SILICON COMPOUNDS; ULTRAVIOLET RAYS;

EID: 77957014120     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.020019     Document Type: Article

References (19)

1. T. W. Barbee, Jr., S. Mrowka, and M. C. Hettrick, "Molybdenum- silicon multilayer mirrors for the extreme ultraviolet," Appl. Opt. 24(6), 883-886 (1985).
2. K. Skulina, C. Alford, R. Bionta, D. Makowiecki, E. Gullikson, R. Soufli, J. Kortright, and J. Underwood, "Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet," Appl. Opt. 34(19), 3727-3730 (1995).
3. S. Bajt, H. N. Chapman, N. Nguyen, J. Alameda, J. C. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio, and S. Grantham, "Design and performance of capping layers for extreme-ultraviolet multilayer mirrors," Appl. Opt. 42(28), 5750-5758 (2003).
4. M. G. Pelizzo, M. Suman, G. Monaco, P. Nicolosi, and D. L. Windt, "High performance EUV multilayer structures insensitive to capping layer optical parameters," Opt. Express 16(19), 15228-15237 (2008).
5. S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, "Enhanced reflectivity and stability of Sc/Si multilayers," Proc. SPIE 5193, 155-163 (2004).
6. A. Aquila, F. Salmassi, Y. Liu, and E. M. Gullikson, "Tri-material multilayer coatings with high reflectivity and wide bandwidth for 25 to 50 nm extreme ultraviolet light," Opt. Express 17(24), 22102-22107 (2009).
7. P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, "Optical, chemical and depth characterization of Al/SiC periodic multilayers," Proc. SPIE 7360, O1-O9 (2009).
8. A. Galtayries, M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, C. Hecquet, and F. Delmotte, "Nanometer designed Al/SiC periodic multilayers: characterization by a multi-technique approach," Surf. Interface Anal. 42(6-7), 653-657 (2010).
9. : J. Gautier, F. Delmotte, M. Roulliay, F. Bridou, M.-F. Ravet, and A. Jérome, "Study of normal incidence of three-component multilayer mirrors in the range 20-40 nm," Appl. Opt. 44(3), 384-390 (2005).
10. S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, "The BEAR beamline at ELETTRA," AIP Conf. Proc. 705, 450-453 (2004).
11. A. Galtayries, S. Wisniewski, and J. Grimblot, "Formation of thin oxide and sulphide films on polycrystalline molybdenum foils: characterization by XPS and surface potential variations," J. Electron Spectrosc. Relat. Phenom. 87(1), 31-44 (1997).
12. 3," J. Chem. Phys. 90(6), 3318-3331 (1989).
13. Y. Mizokawa, K. M. Geib, and C. W. Wilmsen, "Characterization of β-SiC surfaces and the Au/SiC interface," J. Vac. Sci. Technol. A 4(3), 1696-1700 (1986).
14. 2O molar ratio of sodium silicate on the corrosion resistance of silicate conversion coatings," Surf. Coat. Tech. 204(8), 1229-1235 (2010).
15. S. Tanuma, C. J. Powell, and D. R. Penn, "Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50-2000 eV range," Surf. Interface Anal. 21(3), 165-176 (1994).
16. J. H. Scofield, "Hartree-Slater subshell photoionization cross-sections at 1254 and 1487 eV," J. Electron Spectrosc. Relat. Phenom. 8(2), 129-137 (1976).
17. D. L. Windt, "IMD - Software for modeling the optical properties of multilayer films," Comput. Phys. 12(4), 360-370 (1998).
18. E. Meltchakov, C. Hecquet, M. Roulliay, S. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, "Development of Al-based multilayer optics for EUV," Appl. Phys., A Mater. Sci. Process. 98(1), 111-117 (2010).
19. P. Jonnard, K. Le Guen, M.-H. Hu, J.-M. André, E. Meltchakov, C. Hecquet, F. Delmotte, and A. Galtayries, "Optical, chemical and depth characterization of Al/SiC periodic multilayers", Proc. SPIE 7360, 7360O1-7360O9 (2009).