SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 518, Issue 24, 2010, Pages 7412-7415

Characteristics of highly orientated BiFeO3 thin films on a LaNiO3-coated Si substrate by RF sputtering

(3) Liu, Yen Ting a Chen, San Yuan a Lee, Hsin Yi a,b

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER (Taiwan)

Author keywords

RF sputtering; Thin films; X ray diffraction

Indexed keywords

BISMUTH COMPOUNDS; CRYSTALLINE MATERIALS; IRON COMPOUNDS; LANTHANUM COMPOUNDS; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; REFLECTION; SILICON; SURFACE ROUGHNESS; X RAY DIFFRACTION;

DEPOSITION TEMPERATURES; DIFFRACTION MEASUREMENTS; PARTIALLY CRYSTALLINE; POLYCRYSTALLINE FILM; REMNANT POLARIZATIONS; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 77956881243 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.05.003 Document Type: Conference Paper

Times cited : (5)

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