Influence of oxygen pressure on the structural, electrical and optical properties of VO2 thin films deposited on ZnO/glass substrates by pulsed laser deposition

Thin Solid Films

Volumn 518, Issue 24, 2010, Pages 7441-7444

  Chiu, Te Wei ^b   Tonooka, Kazuhiko ^a   Kikuchi, Naoto ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Oxygen pressure; Preferential orientation; VO2; ZnO buffer

Indexed keywords

CRYSTALLINE ORIENTATIONS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL CONDUCTIVITY; GLASS SUBSTRATES; INFLUENCE OF OXYGEN; INFRARED REFLECTANCE; METAL TARGET; OXYGEN PRESSURE; PREFERENTIAL ORIENTATION; SINGLE CRYSTAL SUBSTRATES; STRUCTURAL AND ELECTRICAL PROPERTIES; SURFACE COMPOSITIONS; VANADIUM OXIDE THIN FILMS; VARYING TEMPERATURE; VO2; X-RAY DIFFRACTION STUDIES; ZNO; ZNO BUFFER LAYER;

ABLATION; ELECTRIC CONDUCTIVITY; GLASS; GLASS LASERS; METAL INSULATOR BOUNDARIES; METAL INSULATOR TRANSITION; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN; PULSED LASER DEPOSITION; PULSED LASERS; SAPPHIRE; SEMICONDUCTOR INSULATOR BOUNDARIES; SINGLE CRYSTALS; SUBSTRATES; THIN FILMS; VANADIUM; VANADIUM COMPOUNDS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

DEPOSITION;

EID: 77956881087     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.05.019     Document Type: Conference Paper

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