Novel pulsed-laser-deposition - VO2 thin films for ultrafast applications

Journal of Electronic Materials

Volumn 34, Issue 5, 2005, Pages 491-496

  Liu, H ^a   Vasquez, O ^a   Santiago, V R ^a   Diaz, L ^a   Rua, A J ^a   Fernandez, F E ^a  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

Author keywords

Pulsed laser deposition (PLD); Thin film; Ultrafast

Indexed keywords

CRYSTAL LATTICES; FOUR WAVE MIXING; HYSTERESIS; PHASE TRANSITIONS; PULSED LASER DEPOSITION; ULTRAFAST PHENOMENA; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

DEGENERATE-FOUR-WAVE-MIXING (DFWM); LATTICE REORIENTATION POLARIZATION; ULTRAFAST; VO2;

THIN FILMS;

EID: 20344362921     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-005-0056-y     Document Type: Conference Paper

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