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Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 268, Issue 21, 2010, Pages 3395-3402

Incorporation of oxygen during oxidative annealing of thermally evaporated in films

(7) Rao, Pritty a Kumar, Sanjiv a Reddy, G L N a Veena, S a Kalavathi, S b Ramana, J V a Raju, V S a

a BHABHA ATOMIC RESEARCH CENTRE (India)

b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH (India)

Author keywords

Band gap; Indium; Indium oxide; Oxygen depth profiling; Thermal evaporation

Indexed keywords

ADSORBED OXYGEN; AS-DEPOSITED STATE; AS-GROWN; BAND GAPS; CRYSTALLINITIES; DEPTH PROFILE; ENHANCED REACTIVITY; FLAT-TOP; GLANCING INCIDENCE X-RAY DIFFRACTIONS; GRADUAL OXIDATION; HIGH SURFACE ENERGY; HIGH TRANSMISSION; IN-BAND; INDIUM METAL; INDIUM OXIDE; INDIUM OXIDE FILMS; NANO-SIZED; NUCLEAR REACTIONS; OPTICAL CHARACTERISTICS; OXIDATION RESISTANT; POLYCRYSTALLINE; RESONANT SCATTERING; SURFACE FREE ENERGY; TEMPERATURE RANGE; WELL-ALIGNED;

ANNEALING; ATOMIC FORCE MICROSCOPY; DEPTH PROFILING; DIFFRACTION; ENERGY GAP; INDIUM; NUCLEAR REACTORS; OXIDATION; OXYGEN; SURFACE CHEMISTRY; THERMAL EVAPORATION; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 77956880051 PISSN: 0168583X EISSN: None Source Type: Journal
DOI: 10.1016/j.nimb.2010.08.003 Document Type: Article

Times cited : (12)

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