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Journal of Applied Physics

Volumn 108, Issue 5, 2010, Pages

Tensile-relaxation behavior of electrodeposited nanocrystalline Ni

(6) Shen, Xixun a Gu, Changdong a Lian, Jianshe a Jiang, Qing a Jiang, Zhonghao a Qin, Liyuan a

a Jilin University (China)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE GRAIN SIZE; COARSE-GRAINED; DEFORMATION PROCESS; DISLOCATION NETWORKS; FLOW STRESS; NANOCRYSTALLINE NI; NANOCRYSTALLINES; RELAXATION BEHAVIORS; RELAXATION TEST; STRAIN HARDENING BEHAVIOR; STRESS SOFTENING; TENSILE TESTS;

DUCTILITY; ELECTRODEPOSITION; STRAIN HARDENING; TENSILE TESTING;

STRAIN RATE;

EID: 77956831549 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3476460 Document Type: Article

Times cited : (13)

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