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Volumn 3, Issue 9, 2010, Pages

Microstructure and light-scattering properties of ZnO:Al films prepared using a two-step process through the control of oxygen pressure

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; CRYSTALLINITIES; DEPOSITION CONDITIONS; ETCHED FILMS; GROWTH MODES; OXYGEN PRESSURE; SEED LAYER; TWO-STEP PROCESS; ZNO:AL FILMS;

FILM PREPARATION; METALLIC FILMS; MICROSTRUCTURE; OXYGEN; ZINC OXIDE;

PROCESS CONTROL;

EID: 77956737360 PISSN: 18820778 EISSN: 18820786 Source Type: Journal
DOI: 10.1143/APEX.3.095801 Document Type: Article

Times cited : (22)

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