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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 11, 2002, Pages 6417-6420

Microcrystalline silicon films and solar cells prepared by photochemical vapor deposition on textured SnO2 with high haze factors

(5) Zhao, Ying a Miyajima, Shinsuke a Ide, Yoshinori a Yamada, Akira a Konagai, Makoto a

a Tokyo Institute of Technology ^* (Japan)

Author keywords

Haze factor; Photochemical vapor deposition; Solar cell; Textured SnO2; c Si

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; FILM GROWTH; GRAIN BOUNDARIES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TIN COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

MICROCRYSTALLINE SILICON FILMS;

SILICON SOLAR CELLS;

EID: 0036871774 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.6417 Document Type: Article

Times cited : (22)

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