Highly transparent and high haze ZnO:Al film for front TCO of a-Si:H and μc-Si:H solar cells by controlling oxygen flow

Materials Research Society Symposium Proceedings

Volumn 1153, Issue , 2009, Pages 153-158

  Kang, Dong Won ^a   Kuk, Seung Hee ^a   Ji, Kwang Sun ^b   Ahn, Seh Won ^b   Han, Min Koo ^a  

^a Seoul National University   (South Korea)

^b LG Electronics Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; II-VI SEMICONDUCTORS; METALLIC FILMS; MICROCRYSTALLINE SILICON; OXYGEN; SHEET RESISTANCE; SILICON SOLAR CELLS; SUBSTRATES; THIN FILMS; WET ETCHING; ZINC OXIDE;

CRYSTALLINE PHASE; GLASS SUBSTRATES; HIGH CAPABILITIES; LIGHT-TRAPPING; LOW RESISTIVITY; SOLAR CELL EFFICIENCIES; SURFACE-TEXTURING; ZNO:AL FILMS;

AMORPHOUS SILICON;

EID: 77951135403     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1153-a07-19     Document Type: Conference Paper

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