|
Volumn 174, Issue 1-3, 2010, Pages 127-131
|
Determination of the sputter rate variation pattern of a silicon carbide target for radio frequency magnetron sputtering using optical transmission measurements
|
Author keywords
Deposition rate; Film thickness determination; Magnetron sputtering; Optical constants; Thin films; Wide bandgap semiconductor
|
Indexed keywords
AMORPHOUS FILMS;
AMORPHOUS SILICON;
DEPOSITION RATES;
FILM THICKNESS;
LIGHT TRANSMISSION;
MAGNETRON SPUTTERING;
RADIO WAVES;
RATE CONSTANTS;
SILICON CARBIDE;
WIDE BAND GAP SEMICONDUCTORS;
EMISSION PATTERN;
FILM THICKNESS DETERMINATION;
FILM-THICKNESS;
MAGNETRON-SPUTTERING;
OPTICAL TRANSMISSION MEASUREMENTS;
PROCESS PARAMETERS;
RADIO-FREQUENCY-MAGNETRON SPUTTERING;
THICKNESS DETERMINATION;
THIN-FILMS;
WIDE-BAND-GAP SEMICONDUCTOR;
THIN FILMS;
|
EID: 77956471365
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mseb.2010.03.012 Document Type: Conference Paper |
Times cited : (4)
|
References (13)
|