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Volumn 174, Issue 1-3, 2010, Pages 127-131

Determination of the sputter rate variation pattern of a silicon carbide target for radio frequency magnetron sputtering using optical transmission measurements

Author keywords

Deposition rate; Film thickness determination; Magnetron sputtering; Optical constants; Thin films; Wide bandgap semiconductor

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; DEPOSITION RATES; FILM THICKNESS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; RADIO WAVES; RATE CONSTANTS; SILICON CARBIDE; WIDE BAND GAP SEMICONDUCTORS;

EID: 77956471365     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2010.03.012     Document Type: Conference Paper
Times cited : (4)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.