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Materials Science and Engineering: B

Volumn 173, Issue 1-3, 2010, Pages 7-10

Microstructure and magnetic properties of Co-doped ZnO films deposited by gas flow sputtering

(7) Sakuma, H a Watanabe, Y a Aramaki, K b Yun, K S b Ishii, K a Ikeda, Y b Kondo, H b

a UTSUNOMIYA UNIVERSITY (Japan)

b Sony Chemical and Information Device Corporation (Japan)

Author keywords

Co doped ZnO; Gas flow sputtering; Magnetic properties; Optical absorption; X ray photoelectron spectroscopy

Indexed keywords

COBALT; FERROMAGNETIC MATERIALS; FERROMAGNETISM; FLOW OF GASES; II-VI SEMICONDUCTORS; IONS; LIGHT ABSORPTION; MAGNETIZATION; METALLIC FILMS; OPTICAL PROPERTIES; PHOTOELECTRONS; PHOTONS; SPUTTERING; X RAY DIFFRACTION; ZINC OXIDE;

CO CONCENTRATIONS; CO IONS; CO-DOPED ZNO; ENERGY PROCESS; FERROMAGNETIC COMPONENT; GAS FLOW SPUTTERING; LOWER ENERGIES; MAGNETIC PROPERTIES OF CO; X- RAY DIFFRACTIONS; ZNO FILMS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77956262414 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2010.02.006 Document Type: Conference Paper

Times cited : (11)

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