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Volumn 321, Issue 7, 2009, Pages 872-875
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Gas flow sputtering: Versatile process for the growth of nanopillars, nanoparticles, and epitaxial thin films
a
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Author keywords
Epitaxial thin film; Gas flow sputtering; Nanoparticle; Nanopillar
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Indexed keywords
AERODYNAMICS;
EPITAXIAL GROWTH;
FABRICATION;
FLOW OF GASES;
GALLIUM ALLOYS;
GASES;
IRON ORES;
MAGNETIC MATERIALS;
MAGNETITE;
MOLECULAR BEAM EPITAXY;
NANOPARTICLES;
NITRIDES;
OXIDE MINERALS;
PLATINUM;
SUBSTRATES;
TARGETS;
THIN FILM DEVICES;
EPITAXIAL THIN FILM;
GAAS SUBSTRATES;
GAS FLOW SPUTTERING;
HIGH PRESSURES;
HIGH-RATE DEPOSITIONS;
HOLLOW CATHODE DISCHARGES;
INNER DIAMETERS;
NANOPARTICLE;
NANOPILLAR;
NANOPILLARS;
PARALLEL PLATES;
SPUTTER-DEPOSITION;
SPUTTERING CONDITIONS;
SUBSTRATE HEATING;
EPITAXIAL FILMS;
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EID: 60949102961
PISSN: 03048853
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jmmm.2008.11.053 Document Type: Article |
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Times cited : (20)
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References (14)
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